Chemical compounds with formula C4H3F8N in ThermoML

2,2-difluoroethylbis(trifluoromethyl)amine
K. Otake, M. Yasumoto, Y. Yamada, J. Murata and S. Urata
Critical Parameters and Vapor Pressure Measurements of Potential Replacements for Chlorofluorocarbons-Four Hydrofluorodetones and a Hydrolfuoroamine
J. Chem. Eng. DataYear: 2003Volume: 48Pages: 1380-1383.
Keywords: Critical property, vapor pressure, optical cell, hydrofluoroketone, hydrofluoroamine;
DOI: 10.1021/je020210m
ThermoML: http://trc.nist.gov/journals/jced/2003v48/i06/je020210m.xml


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